8. Laser induced structural or compositional modifications of Si or IV-IV surface: planarization, pulsed laser induced epitaxy, carbon incorporation, chemical etching, Boulmer, J.; Dragnea, B.; Guedj, C.; Debarre, D.; Bosseboeuf, A.; Finkman, E.; Bourguignon, B. Proceedings of SPIE-The International Society for Optical Engineering, 3404(Laser Surface Processing), 149-158 (1998), DOI: 10.1117/12.308609.

8. Laser induced structural or compositional modifications of Si or IV-IV surface: planarization, pulsed laser induced epitaxy, carbon incorporation, chemical etching, Boulmer, J.; Dragnea, B.; Guedj, C.; Debarre, D.; Bosseboeuf, A.; Finkman, E.; Bourguignon, B. Proceedings of SPIE-The International Society for Optical Engineering, 3404(Laser Surface Processing), 149-158 (1998), DOI: 10.1117/12.308609.